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Strong traps for deuterium in krypton-implanted nickel

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.343059· OSTI ID:6622802

Experiments were carried out to investigate strong traps (binding enthalpies>0.50 eV) for deuterium that were found earlier when pure nickel was implanted with argon and krypton at temperatures less than or equal to500 /sup 0/C. In one experiment, three different areas of a nickel specimen were implanted with a fluence of 2 x 10/sup 16/ cm/sup -2/ krypton at 600, 700, and 800 /sup 0/C; a second experiment involved implanting krypton at three different fluences (2, 6, and 20 x 10/sup 15/ cm/sup -2/) in nickel at 500 /sup 0/C. Retained deuterium was monitored during subsequent isochronal anneals using nuclear reaction analysis. In a third experiment, depth profiles for both implanted krypton and trapped deuterium were determined simultaneously using secondary ion mass spectrometry. Traps for deuterium in krypton-implanted nickel were found with binding enthalpies ranging from 0.5 to 1.1 eV. At implantation temperatures <500 /sup 0/C, the traps are in the same location as the krypton atoms. At implantation temperatures >700 /sup 0/C, the traps are found where the krypton was originally implanted in spite of the fact that a significant fraction of the krypton apparently escapes through the surface during the implantation process. The observed fluence and temperature dependence indicate that the traps with binding enthalpies between 0.5 and 1.1 eV are associated with the surfaces of cavities formed during the implantation.

Research Organization:
Physics Department, Augustana College, Rock Island, Illinois 61201
OSTI ID:
6622802
Journal Information:
J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 65:3; ISSN JAPIA
Country of Publication:
United States
Language:
English

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