Orientational dependence of photoelectrochemical etching in n-GaAs
There has been considerable recent interest in photoelectrochemical etching for fabricating microstructures in semiconductors, particularly III-V materials. Yet, little attention has been paid to the orientational dependence of photoelectrochemical etching processes. In this paper, the authors demonstrate that photoelectrochemical etching of n-GaAs in mild electrolytes is dependent on crystalline orientation in a similar way that has been observed previously for chemical etchants such as bromine-methanol and the H/sub 2/SO/sub 4/-H/sub 2/O/sub 2/-H/sub 2/O system. The mild aqueous electrolytes permit etching with a much wider variety of photoresists than would be possible with chemical etchants. All experiments were performed on polished )100) n-GaAs surfaces (Si doped, N/sub d/ = 1.4 x 10/sup 17/) obtained from MA/COM Laser Diode Inc. Stripe patterns were defined in Shipley 1350J positive photoresist spun onto the crystal surface at a thickness of approximately 1 ..mu..m, and baked according to the manufacturer's instructions. Patterns were custom drawn using a computer controlled laser scanner, employing a HeCd laser operating at 442 nm. Typically, lines were 10-15 ..mu..m wide. Lines were produced in the (011), (011), and (010) directions.
- Research Organization:
- EIC Labs., Inc., Norwood, MA
- OSTI ID:
- 6604553
- Journal Information:
- J. Electrochem. Soc.; (United States), Journal Name: J. Electrochem. Soc.; (United States) Vol. 134:1; ISSN JESOA
- Country of Publication:
- United States
- Language:
- English
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37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
400102 -- Chemical & Spectral Procedures
ALKALI METAL COMPOUNDS
AQUEOUS SOLUTIONS
AROMATICS
ARSENIC COMPOUNDS
ARSENIDES
CHEMISTRY
CHLORIDES
CHLORINE COMPOUNDS
CRYSTAL STRUCTURE
CRYSTALS
CURRENTS
DISPERSIONS
DOPED MATERIALS
ELECTRIC CURRENTS
ELECTRICAL EQUIPMENT
ELECTROCHEMISTRY
ELECTROLYTES
ELECTRON MICROSCOPY
EQUIPMENT
ETCHING
FABRICATION
GALLIUM ARSENIDES
GALLIUM COMPOUNDS
GRAIN ORIENTATION
HALIDES
HALOGEN COMPOUNDS
HYDROXY COMPOUNDS
MATERIALS
MICROSCOPY
MICROSTRUCTURE
MIXTURES
ORGANIC ACIDS
ORGANIC COMPOUNDS
ORGANIC SULFUR COMPOUNDS
ORIENTATION
PHENOLS
PHOTOCHEMISTRY
PHOTOCURRENTS
PHOTORESISTORS
PNICTIDES
POLISHING
POLYPHENOLS
POTASSIUM CHLORIDES
POTASSIUM COMPOUNDS
REAGENTS
RESISTORS
SCANNING ELECTRON MICROSCOPY
SODIUM COMPOUNDS
SOLUTIONS
STRUCTURAL CHEMICAL ANALYSIS
SULFONIC ACIDS
SURFACE FINISHING
TIRON