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Lasing characteristics of 0. 8-. mu. m InGaAsP/GaAs lasers fabricated by wet chemical etching

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.343387· OSTI ID:6475755

0.8-..mu..m InGaAsP/GaAs stripe lasers, in which cavity mirrors were formed by two-step wet chemical etching, have been fabricated monolithically. The laser resonators were aligned along the <011-bar> and the <010> directions. The first etching was done in 5% Br methanol. The secondary etching was done in H/sub 2/SO/sub 4/:H/sub 2/O/sub 2/:H/sub 2/O (3:1:1 by volume) etchant for the active layers only, and gave low threshold lasers. Their threshold current densities were compared with those of the cleaved-mirror lasers made from the same wafer. Some longitudinal lasing modes were observed in the wavelength range of 805--810 nm. The characteristic temperature T/sub 0/ was 116 K in the temperature range 28--87 /sup 0/C. The relationship between the state of the etched facets and the near- and far-field patterns was examined. It was found that this two-step etching technique for the laser mirrors is very suitable for aligning the lasers along desirable directions on the same wafer for monolithic integrated optical circuits.

Research Organization:
Department of Electrical Engineering, Faculty of Science and Technology, Keio University, 3-14-1, Hiyoshi, Yokohama 223, Japan
OSTI ID:
6475755
Journal Information:
J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 65:10; ISSN JAPIA
Country of Publication:
United States
Language:
English

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