Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

New scaling relation for sputtered NbN films

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.342582· OSTI ID:6601024
A scaling relationship has been discovered between the sputtering rate and the partial pressure of argon P/sub Ar/, which leaves the superconducting properties of NbN films invariant. As P/sub Ar/ increases for a given sputtering rate, there is a linear reduction of T/sub c/ together with a rapid increase, followed eventually by saturation, in H/sub c//sub 2/ at 4.2 K. These produce a maximum in J/sub c/ (measured at 19 T and 4.2 K) at a particular value of P/sub Ar/. Films exhibiting nearly the same set of superconducting properties and microstructures can be made at a higher fixed sputtering rate if the values of P/sub Ar/ are multiplied by a constant scale factor. This scaling relation is found to hold for two separate sputtering systems, one of which uses a standard diffusion pump while the other uses an oilless turbo pump. Additional comparisons with the results of others reinforces the conclusion that the scaling relationship is universal and thus may provide some insight into those factors in the sputtering process which are important for determining the superconducting properties and microstructure of sputtered NbN films.
Research Organization:
Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439
OSTI ID:
6601024
Journal Information:
J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 65:1; ISSN JAPIA
Country of Publication:
United States
Language:
English

Similar Records

A new scaling relation for sputtered NbN films
Technical Report · Sat Jan 31 23:00:00 EST 1987 · OSTI ID:6482813

Analysis of reactive sputtering mechanisms for NbN film deposition
Journal Article · Tue Sep 01 00:00:00 EDT 1987 · J. Vac. Sci. Technol., A; (United States) · OSTI ID:6167935

NbN formation on carbon fibers with a duo magnetron sputtering system
Journal Article · Thu Jan 31 23:00:00 EST 1985 · J. Appl. Phys.; (United States) · OSTI ID:6188975