A new scaling relation for sputtered NbN films

Technical Report · Sun Feb 01 04:00:00 EST 1987

OSTI ID:6482813

Capone, II, D W; Gray, K E; Kampwirth, R T

We have discovered a scaling relation connecting the properties of NbN films made at different sputtering rates. For a given sputtering rate, as a function of increasing argon partial pressure (P/sub Ar/) we observe a linear reduction of T/sub c/ and a rapid increase in H/sub c2/ (4.2 K) followed by saturation. This produces a maximum in J/sub c/ (measured at 19 T and 4.2 K) vs P/sub Ar/. Films having similar high field superconducting properties (H/sub c2/ and J/sub c/) and microstructures can be made at higher sputtering rates (> 60 /angstrom//s) if a higher argon gas pressure is used. A simple scale factor determines the argon pressure necessary. This scaling relation may provide some insight into those factors in the sputtering process which are important in determining the superconducting properties and microstructure of sputtered NbN films. 10 refs., 2 figs.

• Research Organization: Argonne National Lab., IL (USA)
• DOE Contract Number: W-31109-ENG-38
• OSTI ID: 6482813
• Report Number(s): ANL/PPRNT-89-145; ON: DE89008349
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360101* -- Metals & Alloys-- Preparation & Fabrication
360104 -- Metals & Alloys-- Physical Properties
CRITICAL CURRENT
CRYSTAL STRUCTURE
CURRENTS
ELECTRIC CONDUCTIVITY
ELECTRIC CURRENTS
ELECTRICAL PROPERTIES
FABRICATION
FILMS
MICROSTRUCTURE
NIOBIUM COMPOUNDS
NIOBIUM NITRIDES
NITRIDES
NITROGEN COMPOUNDS
PHYSICAL PROPERTIES
PNICTIDES
REFRACTORY METAL COMPOUNDS
SPUTTERING
SUPERCONDUCTING FILMS
SUPERCONDUCTIVITY
THERMODYNAMIC PROPERTIES
TRANSITION ELEMENT COMPOUNDS
TRANSITION TEMPERATURE