American Vacuum Society, National Symposium, 36th, Boston, MA, Oct. 23-27, 1989, Proceedings. Parts 1 2

Conference · Fri Jun 01 00:00:00 EDT 1990 · Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA)

OSTI ID:6594166

The present conference discusses sputtering and bombardment effects in thin films, process property relationships, thin films for magnetic, optical, ferroelectric, and piezoelectric applications, CVD and activated vapor deposition processes, cluster ion beam deposition, thin film interconnects and packaging, thin film deposition and characterization, the mechanisms of nucleation, epitaxy, and growth, laser deposition and processing, plasma modeling, plasma etching, inertial confinement plasma technology, electron cyclotron resonance, modulated plasma processing, the oxidation and nitridation of semiconductors, metal-semiconductor interfaces, composite interfaces, diamond and diamondlike films, and ion-assisted deposition and surface modification. Also discussed are chemical effects in electron spectroscopy, polymer surfaces and interfaces, adsorption and desorption, surface atomic and electronic structures, vacuum pumps, electron cyclotron resonance plasmas, epitaxy and chemical growth techniques, and heterojunctions and superlattices.

• OSTI ID: 6594166
• Report Number(s): CONF-891093--
• Journal Information: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA), Journal Name: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA) Vol. 8; ISSN 0734-2101; ISSN JVTAD
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360600 -- Other Materials
656000* -- Condensed Matter Physics
70 PLASMA PHYSICS AND FUSION TECHNOLOGY
700100 -- Fusion Energy-- Plasma Research
700208 -- Fusion Power Plant Technology-- Inertial Confinement Technology
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ABSTRACTS
ALUMINIUM COMPOUNDS
ALUMINIUM OXIDES
AMORPHOUS STATE
BEAMS
CATHODES
CHALCOGENIDES
CHARGED PARTICLES
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
COATINGS
COMPOSITE MATERIALS
CONFINEMENT
CRYSTAL STRUCTURE
DEPOSITION
DOCUMENT TYPES
ELECTRODES
ELECTRONIC EQUIPMENT
EQUIPMENT
FILMS
HETEROJUNCTIONS
INERTIAL CONFINEMENT
ION BEAMS
IONS
JUNCTIONS
LABORATORY EQUIPMENT
LEADING ABSTRACT
MAGNETIC PROPERTIES
MATERIALS
MEETINGS
MICROSTRUCTURE
NITRIDES
NITROGEN COMPOUNDS
NITROGEN IONS
OXIDES
OXYGEN COMPOUNDS
PHYSICAL PROPERTIES
PLASMA
PLASMA CONFINEMENT
PLASMA DIAGNOSTICS
PNICTIDES
POLYMERS
PROTECTIVE COATINGS
PUMPS
SEMICONDUCTOR JUNCTIONS
SEMICONDUCTOR MATERIALS
SILICON COMPOUNDS
SILICON OXIDES
SPUTTERING
SURFACE COATING
SURFACES
THIN FILMS
TITANIUM COMPOUNDS
TITANIUM NITRIDES
TRANSITION ELEMENT COMPOUNDS
VACUUM PUMPS