American Vacuum Society, National Symposium, 31st, Reno, NV, December 4-7, 1984, Proceedings. Parts 1 and 2
The topics discussed range over cryopump and gettering state-of-the-art methods, the design of plasma etching and deposition equipment, contamination control and automation in vacuum technology, leak detection, gas analysis and gauging procedures, recent advancements and novel applications in coating deposition and ion implantation processes, the growth and physical properties of hard protective coatings, and in situ diagnostics for process control. Also discussed are thin films for optical and magnetic recording, thin film phenomena and reactions, VLSI metallization, microelectronic packaging, interconnections, and novel applications, thin film segregation and growth processes, applications and characterization methods for semiconductor heterojunctions, epitaxy and deposition, dry processing methods, the electronic and atomic structure of semiconductor interfaces, metal-semiconductor interfaces, and the role of surface cleaning in materials and device processing.
- OSTI ID:
- 5566735
- Report Number(s):
- CONF-841218-
- Journal Information:
- J. Vac. Sci. Technol., A; (United States), Journal Name: J. Vac. Sci. Technol., A; (United States) Vol. 3; ISSN JVTAD
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
420700* -- Engineering-- Vacuum Engineering-- (-1987)
ABSTRACTS
ALLOYS
BREMSSTRAHLUNG
COATINGS
CRYOPUMPS
DEPOSITION
DOCUMENT TYPES
ELECTROMAGNETIC RADIATION
ELECTRON EMISSION
ELECTRON SPECTROSCOPY
EMISSION
EQUIPMENT
FILMS
IMPURITIES
JUNCTIONS
LABORATORY EQUIPMENT
LASER SPECTROSCOPY
LEADING ABSTRACT
MEETINGS
MIRRORS
OPTICAL PROPERTIES
PHOTOELECTRIC EMISSION
PHOTOELECTRON SPECTROSCOPY
PHYSICAL PROPERTIES
PLASMA DIAGNOSTICS
PROTECTIVE COATINGS
PUMPS
RADIATIONS
SEMICONDUCTOR JUNCTIONS
SPECTROSCOPY
SURFACE COATING
SYNCHROTRON RADIATION
TECHNOLOGY ASSESSMENT
THIN FILMS
TUNGSTEN ALLOYS
VACUUM COATING
VACUUM PUMPS
VACUUM SYSTEMS