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Title: American Vacuum Society, National Symposium, 31st, Reno, NV, December 4-7, 1984, Proceedings. Parts 1 and 2

Conference · · J. Vac. Sci. Technol., A; (United States)
OSTI ID:5566735

The topics discussed range over cryopump and gettering state-of-the-art methods, the design of plasma etching and deposition equipment, contamination control and automation in vacuum technology, leak detection, gas analysis and gauging procedures, recent advancements and novel applications in coating deposition and ion implantation processes, the growth and physical properties of hard protective coatings, and in situ diagnostics for process control. Also discussed are thin films for optical and magnetic recording, thin film phenomena and reactions, VLSI metallization, microelectronic packaging, interconnections, and novel applications, thin film segregation and growth processes, applications and characterization methods for semiconductor heterojunctions, epitaxy and deposition, dry processing methods, the electronic and atomic structure of semiconductor interfaces, metal-semiconductor interfaces, and the role of surface cleaning in materials and device processing.

OSTI ID:
5566735
Report Number(s):
CONF-841218-
Journal Information:
J. Vac. Sci. Technol., A; (United States), Vol. 3; Conference: 31. national vacuum symposium, Reno, NV, USA, 3 Dec 1984
Country of Publication:
United States
Language:
English