A 10% Cu(In,Ga)Se{sub 2} based photovoltaic structure formed by electrodeposition and subsequent thermal processing
Journal Article
·
· Journal of the Electrochemical Society
- UNAM, Temixco (Mexico). Energy Research Center
- National Renewable Energy Lab., Golden, CO (United States)
CuIn{sub 1{minus}x}Ga{sub x}Se{sub 2} (CIGS) thin films were formed from an electrodeposited CuInSe{sub 2} (CIS) precursor by thermal processing in vacuum in which the film stoichiometry was adjusted by adding In, Ga, and Se. The structure, composition, morphology and opto-electronic properties of the as-deposited and selenized CIS precursors were characterized by various techniques. A 10% CIGS based thin film solar cell was developed using the electrodeposited and thermally processed film. The cell structure consisted of Mo/CIGS/CdS/ZnO/MgF{sub 2}. The cell parameters such as J{sub SC}, V{sub OC}, FF, and {eta} were determined from I-V characterization of the cell.
- Sponsoring Organization:
- USDOE
- OSTI ID:
- 659185
- Journal Information:
- Journal of the Electrochemical Society, Journal Name: Journal of the Electrochemical Society Journal Issue: 10 Vol. 145; ISSN JESOAN; ISSN 0013-4651
- Country of Publication:
- United States
- Language:
- English
Similar Records
12.3% efficient CuIn{sub 1{minus}x}Ga{sub x}Se{sub 2}-based device from electrodeposited precursor
14.1% CuIn{sub 1{minus}x}Ga{sub x}Se{sub 2}-based photovoltaic cells from electrodeposited precursors
Cu (In,Ga)Se{sub 2} thin films and solar cells prepared by selenization of metallic precursors
Journal Article
·
Mon Mar 31 23:00:00 EST 1997
· Journal of the Electrochemical Society
·
OSTI ID:509393
14.1% CuIn{sub 1{minus}x}Ga{sub x}Se{sub 2}-based photovoltaic cells from electrodeposited precursors
Journal Article
·
Thu Oct 01 00:00:00 EDT 1998
· Journal of the Electrochemical Society
·
OSTI ID:659173
Cu (In,Ga)Se{sub 2} thin films and solar cells prepared by selenization of metallic precursors
Journal Article
·
Mon Jul 01 00:00:00 EDT 1996
· Journal of Vacuum Science and Technology, A
·
OSTI ID:367186