Noise characterization of transistors in a 1. 2 [mu]m CMOS-SOI technology up to a total-dose of 12 Mrad (Si)
- CERN, Geneva (Switzerland)
- Thomson TCS, St. Egreve (France)
The analog performance of the Thomson HSOI3-HD technology has been measured up to a total dose of 12 Mrad(Si) of ionizing radiation ([sup 60]Co). The threshold voltage shift is [minus]170 mV for p-channel and [minus]20 mV for n-channel transistor. Transconductance degradation is respectively 4% and 17%. Noise has been measured in the 500 Hz-25 MHz bandwidth. In addition to the 1/f and white noise, a generation-recombination contribution appears in the noise spectrum. This contribution is sensitive to the bias applied to the backgate and body electrodes. The white noise increase after irradiation is 16% for p-channel and 35% for n-channel transistors. P-channel transistors have very low 1/f noise and are less sensitive to irradiation effects.
- OSTI ID:
- 6559083
- Report Number(s):
- CONF-940726--
- Journal Information:
- IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States), Journal Name: IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States) Vol. 41:6Pt1; ISSN 0018-9499; ISSN IETNAE
- Country of Publication:
- United States
- Language:
- English
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