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Gaseous thermal conductivity of silane, dichlorosilane, trichlorosilane, tetrachlorosilane, and tetrafluorosilane in the temperature range from 28 to 350 C

Journal Article · · Journal of Chemical and Engineering Data; (United States)
DOI:https://doi.org/10.1021/je00017a003· OSTI ID:6539941

Silane and halogenated silanes have been the most important intermediates in the large scale production of solar cell grade silicon. The chlorosilanes are the most commonly used chemical intermediates in semiconductor industries. Gas phase thermal conductivities for silane, dichlorosilane, trichlorosilane, tetrachlorosilane, and tetrafluorosilane are reported between 28 and 350 C using a differential hot-wire technique with helium as the reference gas. Thermal conductivity data for argon and hydrogen are also determined over the entire temperature range to verify the experimental method used. The results are compared with the available literature data. The reproducibility of the values is within 4%.

OSTI ID:
6539941
Journal Information:
Journal of Chemical and Engineering Data; (United States), Journal Name: Journal of Chemical and Engineering Data; (United States) Vol. 40:1; ISSN 0021-9568; ISSN JCEAAX
Country of Publication:
United States
Language:
English