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U.S. Department of Energy
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Studies of defects and solubility limits in SPE grown in- and Sb-implanted silicon

Conference ·
OSTI ID:6537396
Transmission electron microscopy and Rutherford backscattering, channeling techniques have been used to study residual defects and substitutional concentrations of In and Sb in solid-phase-epitaxial (SPE) recrystallized amorphous layers. The substitutional concentrations of In and Sb ions were found to far exceed the thermodynamic solubility limits in relatively defect-free SPE-grown layers. The RBS results are discussed in view of the observed TEM microstructures.
Research Organization:
Oak Ridge National Lab., TN (USA)
DOE Contract Number:
W-7405-ENG-26
OSTI ID:
6537396
Report Number(s):
CONF-810446-3(Draft)
Country of Publication:
United States
Language:
English