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Modeling of hydrogenated amorphous silicon Schottky structures using capacitance-voltage and conductance-voltage measurements

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.332056· OSTI ID:6534334
The conduction process in a-Si:H Schottky structures (metal-I-N/sup +//substrate) is controlled primarily by the intrinsic (I) layer. This layer acts as a photoconductive insulator sandwiched between the bottom injecting contact and top blocking contact. A model incorporating this dual behavior of the I layer has been proposed to develop equations for the terminal dark current, capacitance (C), and conductance-voltage (G-V) characteristics of these structures. The results of dark C-V and G-V computations have been compared with the experimental data. The basic features of dark and illuminated G-V and illuminated C-V data have also been explained on the basis of this model.
Research Organization:
Department of Electrical and Computer Engineering, State University of New York at Buffalo, Amherst, New York 14226
OSTI ID:
6534334
Journal Information:
J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 54:2; ISSN JAPIA
Country of Publication:
United States
Language:
English