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U.S. Department of Energy
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Amorphous silicon solar cells. Quarterly report No. 2, January 1-March 31, 1981

Technical Report ·
OSTI ID:5748424

An analysis of the photoconductive response of Schottky-barrier and p-i-n solar cell structures shows that the photoconductivity determines the fill factor, rather than the dark current, as in crystalline silicon cells. An analysis of the I-V curves of p-i-n cells shows that the electron and hole drift lengths are comparable. High-conductivity p- and n-type films (sigma = 1-10 ..cap omega../sup -1/.cm/sup -1/) have been produced in an rf discharge for T/sub s/ > 400/sup 0/C and in a dc cathodic discharge for T/sub s/ > 350/sup 0/C. Some of these high-conductivity films are clearly microcrystalline, while others appear to be still amorphous. Diffusion lengths of approx. 0.8 ..mu..m have been measured in undoped a-Si:H films at illumination levels of approx. 0.1 Sun. The activation energy of the diffusion length is 0.28 eV. The technique for measuring the diffusion length has been improved by means of a liquid Schottky-barrier contact. Preliminary results confirm that carbon alloying of the p layer improves the performance of p-i-n cells illuminated through that layer. Tests on p-i-n cells with ITO contacts on both sides show that the stability is better for cells illuminated through the p layer. A statistical analysis of solar-cell data indicates that a major factor determining the efficiency of ITO/n-i-p cells is the ITO/n contact. Several parameters have been determined that affect device stability. A gradual boron profile enhances stability, as does a thin, undoped layer. Increased oxygen contamination increases the degradation of a-Si:H p-i-n cells.

Research Organization:
Solar Energy Research Inst., Golden, CO (USA); RCA Labs., Princeton, NJ (USA)
DOE Contract Number:
AC02-77CH00178
OSTI ID:
5748424
Report Number(s):
SERI/PR-0-9372-2; ON: DE81030278
Country of Publication:
United States
Language:
English