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U.S. Department of Energy
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Amorphous silicon solar cells. Quarterly report No. 3, 1 April 1981-30 June 1981

Technical Report ·
OSTI ID:6256619
DLTS measurements on both Schottky-barrier and p-i-n a-Si:H solar cells reveal a deep electron trap that could be associated with the Staebler-Wronski effect. In one series of experiments, the density of metastable defects was proportional to the amount of oxygen and nitrogen introduced by an air bleed. Infrared absorption studies have shown that recent films produced in an rf magnetron mode are comparable to films produced in rf capacitive or dc proximity modes. Auger electron spectroscopy has been used to show that a-Si:H films deposited on substrates such as ITO are initially patchy and become continuous after about 40 to 50 A of growth. An automated system for measuring diffusion lengths is now operational and values as large as 0.47 ..mu..m have been measured in a-Si:H under 1-sun light bias. The Hall effect in p-type a-Si:H (0.4 at. % boron) exhibits the correct sign for temperatures <100/sup 0/C but reverses for high temperatures, thus indicating two hole conduction modes. Conversion efficiencies up to 5.2% have been obtained for p-i-n cells with a microcrystalline p layer. Open-circuit voltages as large as 933 mV have been observed in p-i-n structures with carbon-containing p layers. Diffusion length measurements have been shown to be very sensitive to degradation mechanisms such as electron bombardment.
Research Organization:
State Univ. of New York, Albany (USA). Atmospheric Sciences Research Center; RCA Labs., Princeton, NJ (USA)
DOE Contract Number:
AC02-77CH00178
OSTI ID:
6256619
Report Number(s):
SERI/PR-0-9372-3; ON: DE82001101
Country of Publication:
United States
Language:
English