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Amorphous-silicon solar cells. Quarterly report No. 4, 1 July 1981-30 September 1981

Technical Report ·
OSTI ID:5489594

Modeling of the free carrier space charge in a-Si:H p-i-n solar cells shows that significant field distortion will occur when the i layer is thicker than 1 ..mu..m. Composition analyses have been performed on undoped a-Si:H films that exhibit diffusion lengths greater than 0.5 ..mu..m. The SIMS data gave the following impurity concentrations: oxygen (< 2.6 x 10/sup 19/cm/sup -3/), nitrogen (< 1.4 x 10/sup 19/cm/sup -3/), carbon (< 8.5 x 10/sup 18/cm/sup -3/), chlorine (< 3.5 x 10/sup 16/cm/sup -3/), boron (< 10/sup 17/cm/sup -3/), and phosphorus (< 10/sup 16/cm/sup -3/). The a-Si:H films typically contain between 6.5 and 9.0 at. % hydrogen. Hole mobilities as large as 0.2 cm/sup 2//V-s have been measured in p type a-Si:H (620-ppM boron) using the Hall effect. Conversion efficiencies as high as 5.8% have been obtained in p-i-n cells fabricated with a microcrystalline p layer (maximum value of V/sub oc/ was 920 mV). Surface photovoltage profiling has been used to show that the n/i interface does not contribute to the open-circuit voltage of cells with the structure IT0/p-i-n/steel. For cells with the structure Al/Ti/n-i-p/cermet/IT0/glass it is found that the more stable cells have a relatively large contribution to the built-in potential from the n/i interface and relatively low space-charge densities in the i layer.

Research Organization:
RCA Labs., Princeton, NJ (USA)
DOE Contract Number:
AC02-77CH00178
OSTI ID:
5489594
Report Number(s):
SERI/PR-0-9372-4; ON: DE82005675
Country of Publication:
United States
Language:
English