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Effects of the undoped layer on characteristics of amorphous silicon Schottky diodes

Journal Article · · Electron Device Lett.; (United States)
The effects of undoped layer thickness on the dark and illuminated I-V characteristics of hydrogenated amorphous silicon Schottky barrier solar cells are investigated. Schottky barrier (S.B.) metals having different work function (Cr and Pd) were deposited on the 0.22/mu/m - 1.45/mu/m thick a-Si:H films. Photovoltaic performance, J/sub SC/, V/sub OC/, FF and efficiency, are independent of thickness of the undoped layer if film thickness is larger than the depletion region width. J/sub SC/ and V/sub OC/ are controlled by S.B. metal and FF is independent of S.B. metal. Dark I-V characteristics depend on both S.B. metal and device thickness suggesting a barrier controlled space charge limited phenomena. Variation of turn-on (threshold) voltage with undoped layer thickness can be applied to the design of switching and memory devices. 8 refs.
Research Organization:
State Univ of NY at Buffalo, Amherst
OSTI ID:
5560429
Journal Information:
Electron Device Lett.; (United States), Journal Name: Electron Device Lett.; (United States) Vol. EDL-2:8; ISSN EDLED
Country of Publication:
United States
Language:
English