Highly stable vanadium oxide cathodes prepared by plasma-enhanced chemical vapor deposition
Journal Article
·
· Journal of the Electrochemical Society
- National Renewable Energy Lab., Golden, CO (United States)
Vanadium oxide films have been prepared by plasma-enhanced chemical vapor deposition for rechargeable lithium-battery applications. Vanadium oxytrichloride (VOCl{sub 3}) was employed as the vanadium precursor. Various parameters, such as the partial pressures of carrier gas and reactant gases, substrate temperature, and radio-frequency power, have been optimized to improve the electrochemical properties of the films. The film deposition rate was {approximately}11 {angstrom}/s. The best films obtained in this work displayed an oxygen-to-vanadium atomic ratio close to that of V{sub 6}O{sub 13}. These films exhibited a high discharge capacity and were very stable during electrochemical cycling. The discharge capacity of these films exceeded 408 mAh/g (or 1,265 mAh/cm{sup 3}) when tested between 4.0 and 1.5 V, and the energy density of these films ({approximately}5,000 {angstrom} thick) was 960.3 Wh/kg. The films exhibited negligible capacity fade from the second cycle to more than 5800 cycles when cycled between 4.0 and 1.8 V with a current density of 114 {micro}A/cm{sup 2}. The combination of high capacity, extended cycling stability, and rapid deposition rate make both this material and its deposition technology very attractive choices for the manufacturers of rechargeable lithium batteries.
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- OSTI ID:
- 653344
- Journal Information:
- Journal of the Electrochemical Society, Journal Name: Journal of the Electrochemical Society Journal Issue: 6 Vol. 145; ISSN 0013-4651; ISSN JESOAN
- Country of Publication:
- United States
- Language:
- English
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