High performance vanadium oxide thin film electrodes for rechargeable lithium batteries

Conference · Wed Jul 01 04:00:00 EDT 1998

OSTI ID:20019168

Zhang, J G; Liu, P; Tracy, C E; Benson, D K; Turner, J A

Plasma Enhanced Chemical Vapor Deposition (PECVD) was used to prepare vanadium oxide thin films as cathodes for rechargeable lithium batteries. The reactants consisted of a high vapor pressure liquid source of vanadium (VOCl{sub 3}) and hydrogen and oxygen gas. Deposition parameters such as the flow rates of H{sub 2}, O{sub 2} and VOCl{sub 3}, the substrate temperature and the Rf power were optimized, and high deposition rate of 11 {angstrom}/s was obtained. Vanadium oxide films with high discharge capacities of up to 408 mAh/g were prepared. The films also showed a superior cycling stability between 4 and 1.5 V at a C/0.2 rate for more than 4,400 cycles. The films were amorphous up to a deposition temperature of 300 C, however, deposition on to substrates with textured surfaces facilitated the formation of crystalline films. The authors demonstrate that both the vanadium oxide material and the PECVD deposition method are very attractive for constructing thin-film rechargeable lithium batteries with high capacity and long-term cyclic stability.

• Research Organization: National Renewable Energy Lab., Golden, CO (US)
• Sponsoring Organization: US Department of Energy
• OSTI ID: 20019168
• Country of Publication: United States
• Language: English

Related Subjects

25 ENERGY STORAGE
36 MATERIALS SCIENCE
CATHODES
CHEMICAL VAPOR DEPOSITION
CRYSTAL STRUCTURE
ELECTROCHEMISTRY
EXPERIMENTAL DATA
METAL-NONMETAL BATTERIES
VANADIUM OXIDES