Oriented growth of niobium and molybdenum on GaAs crystals
Journal Article
·
· J. Appl. Phys.; (United States)
Thin layers of Mo and Nb, 100--400 A thick, were deposited onto clean (100) and (1-bar1-bar1-bar)GaAs substrates under ultrahigh vacuum conditions in a molecular-beam epitaxy system, at slow rates and at relatively low temperatures. The microstructure of the films and the orientation relationship with the substrates were determined by in situ reflection high-energy electron diffraction, by transmission electron microscopy, and by grazing-incidence x-ray diffraction. In spite of the large lattice mismatch to GaAs (11% for Mo and 17% for Nb) and the low deposition temperatures(<400 /sup 0/C), oriented deposits were obtained on both substrates for both metals. Although both metals are body-centered cubic with similar lattice parameters, and are both of similar chemical behavior, they grow differently on GaAs. Molybdenum grows epitaxially in the (111) orientation on both (100) and (1-bar1-bar1-bar)GaAs substrates, whereas niobium grows with the (100) orientation on (100)GaAs, and with no simple orientation on (1-bar1-bar1-bar)GaAs. In both cases, the orientational spread (deduced from the diffraction patterns) is smallest when the lattice planes parallel to the interface have the same symmetry in film and substrate.
- Research Organization:
- IBM Thomas J. Watson Research Center, P.O. Box 218, Yorktown Heights, New York 10598
- OSTI ID:
- 6512421
- Journal Information:
- J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 62:2; ISSN JAPIA
- Country of Publication:
- United States
- Language:
- English
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Sun Jul 15 20:00:00 EDT 2018
· Journal of Applied Physics
·
OSTI ID:1540195
Related Subjects
36 MATERIALS SCIENCE
360102* -- Metals & Alloys-- Structure & Phase Studies
ARSENIC COMPOUNDS
ARSENIDES
COATINGS
COHERENT SCATTERING
CRYSTAL STRUCTURE
DEPOSITION
DIFFRACTION
DIMENSIONS
ELEMENTS
EPITAXY
GALLIUM ARSENIDES
GALLIUM COMPOUNDS
INTERFACES
LATTICE PARAMETERS
MEDIUM TEMPERATURE
METALS
MICROSTRUCTURE
MOLECULAR BEAM EPITAXY
MOLYBDENUM
NIOBIUM
PNICTIDES
SCATTERING
SURFACE COATING
THICKNESS
TRANSITION ELEMENTS
VAPOR DEPOSITED COATINGS
X-RAY DIFFRACTION
360102* -- Metals & Alloys-- Structure & Phase Studies
ARSENIC COMPOUNDS
ARSENIDES
COATINGS
COHERENT SCATTERING
CRYSTAL STRUCTURE
DEPOSITION
DIFFRACTION
DIMENSIONS
ELEMENTS
EPITAXY
GALLIUM ARSENIDES
GALLIUM COMPOUNDS
INTERFACES
LATTICE PARAMETERS
MEDIUM TEMPERATURE
METALS
MICROSTRUCTURE
MOLECULAR BEAM EPITAXY
MOLYBDENUM
NIOBIUM
PNICTIDES
SCATTERING
SURFACE COATING
THICKNESS
TRANSITION ELEMENTS
VAPOR DEPOSITED COATINGS
X-RAY DIFFRACTION