New oxidation state of tantalum oxide formed by reactive ion-beam cosputtering of Ta and Si

Journal Article · Wed Jul 01 04:00:00 EDT 1987 · J. Vac. Sci. Technol., A; (United States)

DOI:https://doi.org/10.1116/1.574535· OSTI ID:6511753

Morisaki, H; Masaki, S; Watanabe, S

Fabrication of composite films of SiO/sub 2/ and Ta/sub 2/O/sub 5/ with various constituent combinations has been attempted on Si substrates by a reactive ion-beam sputter-deposition technique. The films have been studied by Auger electron spectroscopy, infrared absorption spectroscopy, and x-ray diffraction. Infrared absorption spectra of the composite films have shown that the absorption peak corresponding to the Ta--O stretching mode of Ta/sub 2/O/sub 5/ (650 cm/sup -1/) is strongly suppressed, and instead a new peak appears at 950 cm/sup -1/. New peaks have also been noted in x-ray diffraction from the composite films. According to the quantitative analysis of the Auger spectra, there has been no indication of silicide formation in the films. Crystallographic considerations have shown that a plausible oxidation state of the Ta--Si binary system is an oxy-salt composed of Ta cations and silicate anions rather than a simple mixture of SiO/sub 2/ and Ta/sub 2/O/sub 5/ (a complex oxide). The apparent low dielectric constant of tantalum oxides sputter deposited on Si substrates has also been explained by this new oxidation state of the Ta--Si system formed in the initial stage of the sputtering.

• Research Organization: University of Electro-Communications, Chofu-shi, Tokyo 182, Japan
• OSTI ID: 6511753
• Journal Information: J. Vac. Sci. Technol., A; (United States), Journal Name: J. Vac. Sci. Technol., A; (United States) Vol. 5:4; ISSN JVTAD
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360201* -- Ceramics
Cermets
& Refractories-- Preparation & Fabrication
360204 -- Ceramics
Cermets
& Refractories-- Physical Properties
360205 -- Ceramics
Cermets
& Refractories-- Corrosion & Erosion
ABSORPTION SPECTRA
CHALCOGENIDES
CHEMICAL COMPOSITION
CHEMICAL REACTIONS
COHERENT SCATTERING
COMPOSITE MATERIALS
DEPOSITION
DIFFRACTION
INFRARED SPECTRA
MATERIALS
MINERALS
OXIDATION
OXIDE MINERALS
OXIDES
OXYGEN COMPOUNDS
REFRACTORY METAL COMPOUNDS
SCATTERING
SILICA
SILICON COMPOUNDS
SILICON OXIDES
SPECTRA
SPUTTERING
SURFACE COATING
TANTALUM COMPOUNDS
TANTALUM OXIDES
TRANSITION ELEMENT COMPOUNDS
X-RAY DIFFRACTION