Chemical and spectroscopic studies of metal oxide surfaces
- Department of Chemistry, Texas A&M University, College Station, Texas 77843 (United States)
Thin oxide films (e.g., 5{endash}10 nm of SiO{sub 2}, Al{sub 2}O{sub 3}, NiO, MgO) supported on a refractory metal substrate (e.g., Mo, W, Ta, Re) have been prepared by deposition of the oxide metal precursor in a background of oxygen. The thin-film nature of these samples facilitates investigation by an array of surface techniques, many of which cannot be effectively utilized on the corresponding bulk oxide. The structural, electronic, and chemical properties of these films have been studied with temperature programmed desorption, Auger electron spectroscopy, X-ray photoelectron spectroscopy, ion scattering spectroscopy, high resolution electron energy loss spectroscopy, and infrared reflection absorption spectroscopy. The results of these studies demonstrate the viability of using thin oxide films as models for the corresponding bulk oxide. {copyright} {ital 1996 American Vacuum Society}
- OSTI ID:
- 284669
- Report Number(s):
- CONF-9510385--
- Journal Information:
- Journal of Vacuum Science and Technology, A, Journal Name: Journal of Vacuum Science and Technology, A Journal Issue: 3 Vol. 14; ISSN 0734-2101; ISSN JVTAD6
- Country of Publication:
- United States
- Language:
- English
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