Chemical and spectroscopic studies of metal oxide surfaces

Conference · Fri Dec 01 04:00:00 EST 1995

OSTI ID:126281

Goodman, W ^[1]

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1. Texas A & M Univ., College Station, TX (United States)

A new approach to the study of oxide surfaces will be described. Thin oxide films ({approximately} 100{Angstrom}) of SiO{sub 2}, Al{sub 2}O{sub 3}, NiO, and MgO supported on a refractory metal substrate (e.g., Mo or W) have been prepared by depositing the oxide metal precursor in a background of oxygen (ca. 1x10{sup -5} Tort). These thin-film oxide samples facilitate investigation by an array of surface techniques, including high resolution electron energy loss spectroscopy (HREELS) and infrared reflection absorption spectroscopy (IRAS). In addition, the growth of small Cu and Pd particles, prepared by vacuum vapor deposition, on alumina and silica films have been studied. Nitric oxide decomposition and reaction with carbon monoxide on the Cu and Pd particles has been investigated using TPD, HREELS, IRAS. These systems will be compared with respect to their special chemistry for the CO/NO reaction.

• OSTI ID: 126281
• Report Number(s): CONF-950402--
• Country of Publication: United States
• Language: English

Related Subjects

01 COAL, LIGNITE, AND PEAT
36 MATERIALS SCIENCE
ABSORPTION SPECTROSCOPY
AIR POLLUTION CONTROL
ALUMINIUM OXIDES
CARBON MONOXIDE
CATALYSIS
CHEMICAL REACTIONS
COMBUSTION PRODUCTS
COPPER
CRYSTAL GROWTH
DECOMPOSITION
ENERGY-LOSS SPECTROSCOPY
FOSSIL FUELS
MAGNESIUM OXIDES
MICROSTRUCTURE
NICKEL OXIDES
NITRIC OXIDE
PALLADIUM
SILICA
THIN FILMS