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Chemistry of grain boundary and bulk hydrogen in polysilicon

Conference ·
OSTI ID:6499953

Results are summarized on kinetic modeling and Fourier transform infrared studies of the grain boundary passivation of polycrystalline silicon with monatomic hydrogen plasmas. By studying the electrical conductivity of polysilicon as a function of depth and time, considerable insight has been obtained concerning the overall pattern of hydrogen flow into the boundaries, and diffusion coefficients have been determined. In addition, FT-IR spectroscopy has yielded information about the detailed nature of the passivated sites and the exchange of hydrogen between sites during high temperature annealing. However, direct correlation between infrared band intensities and electrical conductivity have not been observed for treated polysilicon. In this paper we summarize our recent results in these two areas, discuss some limitations of these studies and pose important questions which need to be resolved.

Research Organization:
Sandia National Labs., Albuquerque, NM (USA)
DOE Contract Number:
AC04-76DP00789
OSTI ID:
6499953
Report Number(s):
SAND-85-1565C; CONF-851043-15; ON: DE86002167
Country of Publication:
United States
Language:
English