Long pulse behavior of the avalanche/self-sustained discharge pumped XeCl laser
Journal Article
·
· Appl. Phys. Lett.; (United States)
Homogeneous and stable avalanche/self-sustained discharges of 200-nsec duration have been obtained in typical XeCl laser gas mixtures at relatively high gas pressures (1--4 atm) and high energy loadings (100--400 J/liter-atm). The laser output waveform, however, is found to be surprisingly sensitive to changes in gas pressure and composition. Under certain conditions, the laser power remains nearly constant for 200 nsec, so that the total output energy scales roughly with the discharge duration. The highest XeCl laser pulse energy extracted from a 1-liter volume in this series of experiments is 3.2 J at approx.4% intrinsic efficiency.
- Research Organization:
- University of California, San Digeo, La Jolla, California 92093
- OSTI ID:
- 6465531
- Journal Information:
- Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 39:4; ISSN APPLA
- Country of Publication:
- United States
- Language:
- English
Similar Records
Study of x-ray preionized avalanche discharge XeCl laser at high gas pressures
Electron-beam-controlled discharge XeCl excimer laser
XeCl Avalanche discharge laser employing Ar as a diluent
Journal Article
·
Sat Feb 28 23:00:00 EST 1981
· Appl. Phys. Lett.; (United States)
·
OSTI ID:6827181
Electron-beam-controlled discharge XeCl excimer laser
Journal Article
·
Mon May 15 00:00:00 EDT 1978
· Appl. Phys. Lett.; (United States)
·
OSTI ID:5093463
XeCl Avalanche discharge laser employing Ar as a diluent
Patent
·
Wed Dec 31 23:00:00 EST 1980
·
OSTI ID:864048
Related Subjects
42 ENGINEERING
420300* -- Engineering-- Lasers-- (-1989)
CHLORIDES
CHLORINE COMPOUNDS
COMPUTERIZED SIMULATION
DISPERSIONS
EFFICIENCY
ELECTRIC DISCHARGES
ENERGY-LEVEL TRANSITIONS
EXCITATION
GAS LASERS
HALIDES
HALOGEN COMPOUNDS
LASERS
MEDIUM PRESSURE
MIXTURES
PRESSURE DEPENDENCE
PULSES
QUANTITY RATIO
RARE GAS COMPOUNDS
SENSITIVITY
SIMULATION
STABILITY
TIME DEPENDENCE
WAVE FORMS
XENON CHLORIDES
XENON COMPOUNDS
420300* -- Engineering-- Lasers-- (-1989)
CHLORIDES
CHLORINE COMPOUNDS
COMPUTERIZED SIMULATION
DISPERSIONS
EFFICIENCY
ELECTRIC DISCHARGES
ENERGY-LEVEL TRANSITIONS
EXCITATION
GAS LASERS
HALIDES
HALOGEN COMPOUNDS
LASERS
MEDIUM PRESSURE
MIXTURES
PRESSURE DEPENDENCE
PULSES
QUANTITY RATIO
RARE GAS COMPOUNDS
SENSITIVITY
SIMULATION
STABILITY
TIME DEPENDENCE
WAVE FORMS
XENON CHLORIDES
XENON COMPOUNDS