Electron-beam-controlled discharge XeCl excimer laser

Journal Article · Mon May 15 04:00:00 EDT 1978 · Appl. Phys. Lett.; (United States)

DOI:https://doi.org/10.1063/1.89874· OSTI ID:5093463

Levatter, J I; Morris, J H; Lin, S

A large-volume (6-liter) electron-beam-controlled discharge of about 1 ..mu..sec duration in a Xe/Ar mixture with HCl as the chlorine donor has been utilized to achieve efficient XeCl laser generation at 3080 A. At a fixed gas pressure and e-beam current, the laser output is found to increase rapidly with the initial sustainer field strength up to the spontaneous breakdown limit. Near such a limit, a factor-of-25 enhancement of the XeCl laser output energy over that due to e-beam pumping alone has been observed at 1 atm total pressure. The specific output pulse energy density and laser efficiency based on total energy deposition, of 0.5 J/liter atm and 0.7%, respectively, are beginning to approach the best values reported in the literature for the XeF and KrF lasers.

• Research Organization: University of California, San Diego, La Jolla, California 92093
• OSTI ID: 5093463
• Journal Information: Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 32:10; ISSN APPLA
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
420300* -- Engineering-- Lasers-- (-1989)
ABSORPTION
ARGON
BEAMS
CHLORIDES
CHLORINE COMPOUNDS
EFFICIENCY
ELECTRIC DISCHARGES
ELECTRON BEAMS
ELEMENTS
ENERGY ABSORPTION
ENERGY LOSSES
ENERGY-LEVEL TRANSITIONS
EXCITATION
GAS LASERS
HALIDES
HALOGEN COMPOUNDS
HYDROCHLORIC ACID
HYDROGEN COMPOUNDS
INORGANIC ACIDS
LASERS
LEPTON BEAMS
NONMETALS
PARTICLE BEAMS
RARE GAS COMPOUNDS
RARE GASES
XENON
XENON CHLORIDES
XENON COMPOUNDS