XeCl Avalanche discharge laser employing Ar as a diluent

Patent · Wed Dec 31 23:00:00 EST 1980

OSTI ID:864048

Sze, Robert C ^[1]

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1. Santa Fe, NM

A XeCl avalanche discharge exciplex laser which uses a gaseous lasing starting mixture of: (0.2%-0.4% chlorine donor/2.5%-10% Xe/97.3%-89.6% Ar). The chlorine donor normally comprises HCl but can also comprise CCl.sub.4 BCl.sub.3. Use of Ar as a diluent gas reduces operating pressures over other rare gas halide lasers to near atmospheric pressure, increases output lasing power of the XeCl avalanche discharge laser by 30% to exceed KrF avalanche discharge lasing outputs, and is less expensive to operate.

• Research Organization: Los Alamos National Laboratory (LANL), Los Alamos, NM
• Assignee: United States of America as represented by United States (Washington, DC)
• Patent Number(s): US 4301425
• OSTI ID: 864048
• Country of Publication: United States
• Language: English

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