Ion beam characterization of multi-layer dielectric reflectors

Conference · Tue Jan 01 04:00:00 EST 1985

DOI:https://doi.org/10.1520/STP18770S· OSTI ID:6461705

Beery, J G; Hollander, M G; Maggiore, C J; Redondo, A; Westervelt, R T; Taylor, T N

Energetic ion beams were used to characterize multilayer dielectric reflectors. Alpha-particle beams with beam spot sizes between 10 microns and a few millimeters were scattered from reflectors consisting of 32-layer SiO/sub 2//HfO/sub 2/ and 38-layer MgF/sub 2//ThF/sub 4/. The RBS spectra reveal the nature of the laser damage processes by providing information on diffusion, mixing, and loss of material in the coatings. The particle-induced x-ray emission (PIXE) technique gave complimentary results on low-concentration impurities in the coatings.

• Research Organization: Los Alamos National Lab., NM (USA)
• DOE Contract Number: W-7405-ENG-36
• OSTI ID: 6461705
• Report Number(s): LA-UR-85-3785; CONF-851052-1; ON: DE86003689
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
420300* -- Engineering-- Lasers-- (-1989)
ALPHA PARTICLES
BEAMS
CHARGED PARTICLES
CHEMICAL ANALYSIS
COATINGS
DIELECTRIC MATERIALS
DIELECTRIC PROPERTIES
ELASTIC SCATTERING
ELECTRICAL PROPERTIES
ION BEAMS
ION MICROPROBE ANALYSIS
LASERS
MATERIALS
MICROANALYSIS
NONDESTRUCTIVE ANALYSIS
OPTICAL PROPERTIES
PHYSICAL PROPERTIES
REFLECTIVE COATINGS
REFLECTIVITY
RUTHERFORD SCATTERING
SCATTERING
SURFACE PROPERTIES
X-RAY EMISSION ANALYSIS