Angular dependence of multilayer-reflector damage thresholds
The damage resistance of HfO/sub 2//SiO/sub 2/ multilayer dielectric reflectors was measured as a function of angle of incidence with 351-nm XeF-laser irradiation. The laser produced nominal 10-ns pulses at a repetition rate of 35 pps. A series of reflectors designed for 0/sup 0/, 30/sup 0/, 45/sup 0/, 60/sup 0/, 75/sup 0/, and 85/sup 0/ was tested with an S-plane polarized beam. To account for variations in the separate coating depositions, some of the coating designs were tested at two angles of incidence. At large angles of incidence, we did not observe the anticipated large increases in damage thresholds predicted theoretically on the basis of spatial dilution (1/costheta) of the intensity at the reflector surface and standing-wave electric fields. For example, the threshold for a reflector designed and tested at 85/sup 0/ was only a factor of 2.5 larger than that of normal-incidence reflectors tested at 0/sup 0/. Several possible mechanisms to explain this discrepancy were considered. 11 refs.
- Research Organization:
- Los Alamos National Lab., NM (USA)
- DOE Contract Number:
- W-7405-ENG-36
- OSTI ID:
- 5848098
- Report Number(s):
- LA-UR-86-1547; CONF-8410186-6; ON: DE86011265
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
42 ENGINEERING
420300* -- Engineering-- Lasers-- (-1989)
CHALCOGENIDES
DAMAGE
DEFECTS
DIELECTRIC MATERIALS
FREE ELECTRON LASERS
HAFNIUM COMPOUNDS
HAFNIUM OXIDES
LASER MIRRORS
LASERS
MATERIALS
MIRRORS
OXIDES
OXYGEN COMPOUNDS
REFRACTORY METAL COMPOUNDS
SILICON COMPOUNDS
SILICON OXIDES
TRANSITION ELEMENT COMPOUNDS
420300* -- Engineering-- Lasers-- (-1989)
CHALCOGENIDES
DAMAGE
DEFECTS
DIELECTRIC MATERIALS
FREE ELECTRON LASERS
HAFNIUM COMPOUNDS
HAFNIUM OXIDES
LASER MIRRORS
LASERS
MATERIALS
MIRRORS
OXIDES
OXYGEN COMPOUNDS
REFRACTORY METAL COMPOUNDS
SILICON COMPOUNDS
SILICON OXIDES
TRANSITION ELEMENT COMPOUNDS