UV-laser investigation of dielectric thin films
Conference
·
OSTI ID:552070
- Friedrich-Schiller-Universitaet Jena (Germany); and others
Utilizing thermal Mirage technique, UV laser damage resistivity studies on LaF{sub 3}/MgF{sub 2}, Al{sub 2}O{sub 3}/SiO{sub 2}, and HfO{sub 2}/SiO{sub 2} multilayer stacks have been performed at {lambda} = 248nm, {tau} = 20ns. Investigating these stacks by changing the number of (HL) pairs and the substrate material, optical and thermal coating properties were shown to be responsible for UV single-shot laser damage. Similarly, the damage threshold of selected samples is to be influenced by the deposition technique. Furthermore, multishot damage measurements on LaF{sub 3}/MgF{sub 2} high-reflecting multilayer coatings reveal the accumulation of laser energy in the predamage range.
- Research Organization:
- International Society for Optical Engineering, Washington, DC (United States)
- OSTI ID:
- 552070
- Report Number(s):
- CONF-9510106--Vol.2714
- Country of Publication:
- United States
- Language:
- English
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