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Influence of an electrical field on the macroparticle size distribution in a vacuum arc. [Cu; Ti; Zr; Cr]

Journal Article · · Journal of Vacuum Science and Technology, A
DOI:https://doi.org/10.1116/1.582007· OSTI ID:6459816
 [1];  [2];  [3]
  1. Lawrence Berkeley National Laboratory, Mail Stop-53, University of California, Berkeley, California 94720 (United States)
  2. Multi-Arc Inc., Rockaway, New Jersey 07866 (United States)
  3. Electrical Discharge and Plasma Laboratory, Tel Aviv University, POB 39040, Tel Aviv 69978 (Israel)
The results of experimental study of macroparticle distribution in a vacuum arc presented for Cu, Ti, Zr, and Cr cathodes. We have studied the macroparticle contamination of the films deposited on the substrate having floating potential and biased up to [minus]1000 V with respect to the anode. It has been found that the macroparticle number significantly decreases (by a factor of 3[endash]4) with substrate biasing for all examined cathode materials. A model of macroparticle motion in the quasineutral plasma and near-substrate sheath was proposed. The model bases on analyses of the macroparticle charging and motion in the quasineutral plasma and near substrate sheath. The model can qualitatively explain the macroparticle reduction in the coating due to negatively charged macroparticle reflection in an electric field. [copyright] [ital 1999 American Vacuum Society.] thinsp
OSTI ID:
6459816
Journal Information:
Journal of Vacuum Science and Technology, A, Journal Name: Journal of Vacuum Science and Technology, A Vol. 17:5; ISSN 0734-2101; ISSN JVTAD6
Country of Publication:
United States
Language:
English

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