Macroparticle reflection from a biased substrate in vacuum arc deposition system

Journal Article · Tue Jun 01 04:00:00 EDT 1999 · IEEE Transactions on Plasma Science

DOI:https://doi.org/10.1109/27.774687· OSTI ID:6179554

Keidar, M ^[1]; Beilis, I I ^[2]

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1. Lawrence Berkeley National Lab., CA (United States)
2. Tel Aviv Univ. (Israel). Electrical Discharge and Plasma Lab.

The reflection of macroparticles, generated by a vacuum arc, from a substrate biased negatively with respect to the surrounding plasma is considered. Charging of macroparticle in the near-substrate sheath and its influence on the macroparticle motion were taken into account. It was found that macroparticles can be either reflected or attracted to the substrate depending strongly on the ion current density. The possibility of macroparticle reflection increases with negative bias voltage and saturates at about a few hundred volts.

• OSTI ID: 6179554
• Journal Information: IEEE Transactions on Plasma Science, Journal Name: IEEE Transactions on Plasma Science Vol. 27:3; ISSN ITPSBD; ISSN 0093-3813
• Country of Publication: United States
• Language: English

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