Vacuum arc ion source with filtered plasma for macroparticle-free implantation
Journal Article
·
· Review of Scientific Instruments; (United States)
- Lawrence Berkeley Laboratory, University of California, 1 Cyclotron Road, Berkeley, California 94720 (United States)
An inherent feature of the vacuum arc discharge is that small droplets of micrometer size (macroparticles) are produced along with the plasma in the cathode spots. Droplet contamination of the substrate can occur when implanting metal ions using a vacuum arc ion source. The contamination can be significant for some cathode materials such as lead and other low melting point metals, which for some ion implantation applications such as for semiconductor doping and metallic corrosion inhibition can be a detriment. We have developed a vacuum arc ion source in which the plasma is filtered before the ions are extracted. By guiding the arc-produced plasma through a 60[degree] bent magnetic duct, macroparticles are completely removed from the plasma. No additional power supply for the guiding magnetic field is required since the pulsed arc current itself is used to drive the magnetic solenoid. Tests have shown that macroparticle-free metal ion implantation can be done while maintaining the high ion beam current typical of vacuum arc ion sources.
- DOE Contract Number:
- AC03-76SF00098
- OSTI ID:
- 5018119
- Journal Information:
- Review of Scientific Instruments; (United States), Journal Name: Review of Scientific Instruments; (United States) Vol. 65:4; ISSN 0034-6748; ISSN RSINAK
- Country of Publication:
- United States
- Language:
- English
Similar Records
Characterization of a linear venetian-blind macroparticle filter for cathodic vacuum arcs
Metal plasma immersion ion implantation and deposition using vacuum arc plasma sources
Macroparticle filtering of high-current vacuum arc plasmas
Journal Article
·
Sun Aug 01 00:00:00 EDT 1999
· IEEE Transactions on Plasma Science
·
OSTI ID:687458
Metal plasma immersion ion implantation and deposition using vacuum arc plasma sources
Journal Article
·
Mon Feb 28 23:00:00 EST 1994
· Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States)
·
OSTI ID:5000845
Macroparticle filtering of high-current vacuum arc plasmas
Conference
·
Mon Dec 30 23:00:00 EST 1996
·
OSTI ID:441561
Related Subjects
661220* -- Particle Beam Production & Handling
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
CURRENTS
DROPLETS
ELECTRIC ARCS
ELECTRIC CURRENTS
ELECTRIC DISCHARGES
ELEMENTS
FILTERS
ION IMPLANTATION
ION SOURCES
MAGNETIC FILTERS
METALS
PARTICLES
PERFORMANCE TESTING
TESTING
Ta
Targets-- (1992-)
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
CURRENTS
DROPLETS
ELECTRIC ARCS
ELECTRIC CURRENTS
ELECTRIC DISCHARGES
ELEMENTS
FILTERS
ION IMPLANTATION
ION SOURCES
MAGNETIC FILTERS
METALS
PARTICLES
PERFORMANCE TESTING
TESTING
Ta
Targets-- (1992-)