1315 nm dielectric mirror fabrication by reactive sputtering

Conference · Mon Oct 01 04:00:00 EDT 1984

OSTI ID:6453968

Pawlewicz, W T; Martin, P M; Griffin, J W; Temple, P A

Progress in an on-going effort to fabricate improved laser mirrors from reactively sputtered amorphous oxides (Nb, Ta, Ti, Si), nitrides (Si), and semiconductor alloys (Si:H) is reported. Optimum coating materials have been selected for use at 1315 nm. Materials for shorter wavelengths are also suggested. Supporting data include laser calorimetric absorption coefficients, surface roughnesses deduced from total integrated scattering, refractive indices, and residual mechanical stress levels. An automated reactive gas exchange technique is described for mirror fabrication. Laser calorimetry, total integrated scattering and environmental stability results are presented for fabricated mirrors. Reflectances greater than 0.999 have been achieved.

• Research Organization: Pacific Northwest Lab., Richland, WA (USA); Naval Weapons Center, China Lake, CA (USA)
• DOE Contract Number: AC06-76RL01830
• OSTI ID: 6453968
• Report Number(s): PNL-SA-12594; CONF-8410186-1; ON: DE85003118
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
420300* -- Engineering-- Lasers-- (-1989)
640301 -- Atomic
Molecular & Chemical Physics-- Beams & their Reactions
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
COATINGS
FABRICATION
FILTERS
LASER MIRRORS
MIRRORS
OPTICAL FILTERS
SPUTTERING
SURFACE PROPERTIES