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Preparation of YBa sub 2 Cu sub 3 O sub 7 minus. delta. thin films by magnetron sputtering with in situ plasma oxidation

Journal Article · · Journal of Applied Physics; (USA)
DOI:https://doi.org/10.1063/1.346536· OSTI ID:6429983
; ; ; ; ;  [1]; ;  [2];  [3]
  1. Department of Information Physics, Nanjing University (People's Republic of China)
  2. Department of Physics, Nanjing University (People's Republic of China)
  3. Center of Material Analysis, Nanjing University, (People's Republic of China)

Superconducting YBa{sub 2}Cu{sub 3}O{sub 7{minus}{delta}} thin films with surface roughness Ra{similar to}20 A have been successfully prepared by either rf or dc magnetron sputtering. The substrate temperature was kept at 600--670 {degree}C during deposition and a subsequent {ital in} {ital situ} plasma oxidation treatment was performed at 480--520 {degree}C. The films deposited on single-crystal SrTiO{sub 3} (100) exhibited zero resistance at 91 K and had the critical current density of 3{times}10{sup 6} A/cm{sup 2}. In this paper we describe the influences of fabrication conditions on film superconductivity.

OSTI ID:
6429983
Journal Information:
Journal of Applied Physics; (USA), Journal Name: Journal of Applied Physics; (USA) Vol. 68:5; ISSN 0021-8979; ISSN JAPIA
Country of Publication:
United States
Language:
English