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Epitaxial growth of superconducting YBa sub 2 Cu sub 3 O sub 7 minus x thin films by reactive magnetron sputtering

Journal Article · · Applied Physics Letters; (USA)
DOI:https://doi.org/10.1063/1.102450· OSTI ID:5683789
;  [1]
  1. Department of Physics, Peking University, Beijing 100871, People's Republic of China (CN)

Perfect epitaxial growth of superconducting YBa{sub 2}Cu{sub 3}O{sub 7{minus}{ital x}} thin films have been achieved on (100) SrTiO{sub 3}, (110) SrTiO{sub 3}, and (100) ZrO{sub 2} substrates using a modified planar dc magnetron sputtering system. The films exhibit zero resistances at 87--90 K with transition widths of about 2 K. The critical current density of 1.4{times}10{sup 6} A/cm{sup 2} at 77 K so far has been measured on the (100) SrTiO{sub 3} substrate. The epitaxial orientation of the thin films was influenced by the substrate orientation, the substrate temperature, and the oxygen partial pressure. The quality of growth and the epitaxial orientation of the films were examined by electron channeling, x-ray diffraction, and reflection high-energy electron diffraction techniques. The preferential epitaxial orientation is discussed.

OSTI ID:
5683789
Journal Information:
Applied Physics Letters; (USA), Journal Name: Applied Physics Letters; (USA) Vol. 55:9; ISSN APPLA; ISSN 0003-6951
Country of Publication:
United States
Language:
English

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