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Modulation of electron energy distribution function in radiofrequency SiH/sub 4/, SiH/sub 4/ - H/sub 2/ bulk plasmas

Journal Article · · Plasma Chem. Plasma Process.; (United States)
DOI:https://doi.org/10.1007/BF01016057· OSTI ID:6419578
Electron energy distribution functions (EDF) in SiH/sub 4/, SiH/sub 4/-H/sub 2/ radiofrequency discharges have been calculated by solving the time-dependent Boltzmann equation in the presence of a sinusoidal field. Particular emphasis is given to the modulation of EDF as a function of the applied frequency (..pi.. x 10/sup 6/ less than or equal to omega/p/sub 0/ less than or equal to ..pi.. x 10/sup 8/ sec/sup -1/ torr/sup -1/) and of gas composition. The results show that at omega/p/sub 0/ = ..pi.. x 10/sup 6/ sec/sup -1/ torr/sup -1/ EDF follows in a quasistationary mode the variation of the field with the exception of a small range of electric field near to the zero crossing. Still, at the higher considered frequency (omega/p/sub 0/ = ..pi.. x 10/sup 8/ sec/sup -1/ torr/sup -1/), they observe some modulation of EDF. The necessity of using a time-dependent approach is tested by comparing the present results with the corresponding ones obtained by using the effective field approximation (i.e., the approximation which solves instead of the time-dependent Boltzmann equation the corresponding stationary one at the effective values E = E/sub 0/ ..sqrt..2 of the rf field). The two sets of results can differ by orders of magnitude in the tail of EDF, the differences decreasing with increasing molar fraction of H/sub 2/ and increasing field frequency. The role of excited states (second-kind collisions) is studied by inserting in the Boltzmann equation given concentrations of vibrational and electronic states. The results show that second-kind collisions strongly affect EDF especially in pure silane. Finally a satisfactory agreement has been found between theoretical and experimental results concerning the modulation of electrons of given energy in pure silane discharges.
Research Organization:
Centro di Studio per la Chimica, Bari (Italy)
OSTI ID:
6419578
Journal Information:
Plasma Chem. Plasma Process.; (United States), Journal Name: Plasma Chem. Plasma Process.; (United States) Vol. 8:4; ISSN PCPPD
Country of Publication:
United States
Language:
English