Studies of the initial oxidation of Fe-Si alloys by AES, XPS, EELS, and LEED
Technical Report
·
OSTI ID:6418298
Polycrystalline Fe-8.75at. % Si alloys were investigated at room temperature by various surface spectroscopies, i.e., Auger electron spectroscopy (AES) (including Ar/sup +/ depth profiling), electron energy loss spectroscopy (EELS), and x-ray induced photoelectron spectroscopy (XPS), during the initial oxidation stages under very low oxygen pressure. Experiments performed include (1) scraping to see if the surface concentration of Si on the alloy is inherently different from that of the bulk, (2) AES, EELS, and XPS monitoring during both initial oxidation of pure Fe and Fe-Si, and Ar/sup +/ or Xe/sup +/ etching back to the clean surfaces to determine the relative distribution of Si in the oxide and alloy, and (3) various comparative experiments to identify oxidation states across a thin oxide layer. Fe-6.85at. % Si (110) and (111) single crystal surfaces, and a (110) surface of pure Fe were investigated at room temperature by AES and LEED during the initial oxidation stages under very low oxygen pressures, and by Ar/sup +/ AES depth profiling the oxidized surfaces back to the clean surface. Experiments performed include (1) determination of the best annealing condition for each crystal to provide the cleanest single plane surface, (2) AES monitoring during both initial oxidation of pure Fe and Fe-Si (110), the close-packed plane of bcc crystals, and Ar/sup +/ etching back to the clean surfaces to determine the relative distribution of Si in the oxide and alloy, and (3) repetition on Fe-Si (111) to see the effects of different crystallographic orientations on the initial oxidation behavior. 126 refs., 36 figs., 6 tabs.
- Research Organization:
- Ames Lab., IA (USA)
- DOE Contract Number:
- W-7405-ENG-82
- OSTI ID:
- 6418298
- Report Number(s):
- IS-T-1343; ON: DE89007610
- Country of Publication:
- United States
- Language:
- English
Similar Records
Studies of the initial oxidation of Fe-Si alloys by AES, XPS, EELS, and LEED
Surface passivation of nickel-chromium alloys at room temperature
Surface composition of SiC after ion bombardment, annealing, and exposure to oxygen
Thesis/Dissertation
·
Wed Dec 31 23:00:00 EST 1986
·
OSTI ID:6049863
Surface passivation of nickel-chromium alloys at room temperature
Technical Report
·
Thu Mar 31 23:00:00 EST 1988
·
OSTI ID:5658705
Surface composition of SiC after ion bombardment, annealing, and exposure to oxygen
Journal Article
·
Thu May 01 00:00:00 EDT 1986
· J. Vac. Sci. Technol., A; (United States)
·
OSTI ID:5541275
Related Subjects
36 MATERIALS SCIENCE
360102* -- Metals & Alloys-- Structure & Phase Studies
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
400201 -- Chemical & Physicochemical Properties
ALLOYS
ANNEALING
AUGER ELECTRON SPECTROSCOPY
CHEMICAL REACTIONS
COMPARATIVE EVALUATIONS
CRYSTAL STRUCTURE
CRYSTALS
DIFFUSION
ELECTRON SPECTROSCOPY
ENERGY-LOSS SPECTROSCOPY
EQUATIONS
FILMS
GRAIN BOUNDARIES
HEAT TREATMENTS
IRON ALLOYS
IRON BASE ALLOYS
LAYERS
MICROSTRUCTURE
MONOCRYSTALS
OXIDATION
PHOTOELECTRON SPECTROSCOPY
POLYCRYSTALS
SILICON ALLOYS
SPECTROSCOPY
SURFACES
THIN FILMS
360102* -- Metals & Alloys-- Structure & Phase Studies
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
400201 -- Chemical & Physicochemical Properties
ALLOYS
ANNEALING
AUGER ELECTRON SPECTROSCOPY
CHEMICAL REACTIONS
COMPARATIVE EVALUATIONS
CRYSTAL STRUCTURE
CRYSTALS
DIFFUSION
ELECTRON SPECTROSCOPY
ENERGY-LOSS SPECTROSCOPY
EQUATIONS
FILMS
GRAIN BOUNDARIES
HEAT TREATMENTS
IRON ALLOYS
IRON BASE ALLOYS
LAYERS
MICROSTRUCTURE
MONOCRYSTALS
OXIDATION
PHOTOELECTRON SPECTROSCOPY
POLYCRYSTALS
SILICON ALLOYS
SPECTROSCOPY
SURFACES
THIN FILMS