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A defect etchant for <100> InGaAsP

Journal Article · · J. Electrochem. Soc.; (United States)
DOI:https://doi.org/10.1149/1.2115989· OSTI ID:6406899

A defect revealing etching technique for n-InGaAsP grown on <100> InP by LPE is reported. A chemical solution used with illumination produces protrusions in thin quaternary layers, which correlate well with dislocation pits in underlying and overlying InP layers. Using the new etchant, an increase in defect density in the active layer over the defect density in the buffer layer has been detected in lattice matched (less than or equal to0.04%) InGaAsP/InP LED structures.

Research Organization:
AT and T Bell Laboratories, Murray Hill, New Jersey
OSTI ID:
6406899
Journal Information:
J. Electrochem. Soc.; (United States), Journal Name: J. Electrochem. Soc.; (United States) Vol. 131:8; ISSN JESOA
Country of Publication:
United States
Language:
English