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Optical and structural properties of molecular-beam epitaxial GaAs on sapphire

Journal Article · · J. Vac. Sci. Technol., B; (United States)
DOI:https://doi.org/10.1116/1.584734· OSTI ID:6406743
We have evaluated the structural and optical properties of GaAs grown by molecular-beam epitaxy on (0001) and (011-bar2)-oriented sapphire substrates for possible direct deposition on sapphire optical fibers and optoelectronic device applications. X-ray diffraction studies and cross-sectional transmission electron microscopy measurements show that the GaAs films are single-crystal and have a (111) orientation for both substrate orientations. Both x-ray and temperature-dependent photoluminescence measurements indicate that the quality of the GaAs films is better for the (011-bar2) sapphire orientation. The best results are produced when growth is initiated at a very slow rate (/similar to/0.1 ..mu..m/h) and low temperature (/similar to/400 /sup 0/C) followed by growth parameters for normal homoepitaxial GaAs (1 ..mu..m/h, 560--600 /sup 0/C). The incorporation of a graded band gap strained layer in InGaAs/GaAs superlattice near the sapphire--GaAs interface also improves the optical quality of the GaAs films. Low-temperature photoluminescence spectra is dominated by a peak at 1.49--1.495 eV, with a best linewidth of 26.9 meV, which we believe is due to an integration of several impurity and defect related bound exciton transitions. A peak to lower energies by /similar to/60 meV is thought to be due to acceptorlike impurity defect complexes. Post growth short term halogen lamp annealing marginally improves the overall luminescence intensity of the samples. A linewidth of 20 meV is measured for a (80 A) GaAs/(120 A) Al/sub 0.3/ Ga/sub 0.7/ As multiquantum grown on sapphire.
Research Organization:
Solid State Electronics Laboratory, Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, Michigan 48109-2122
OSTI ID:
6406743
Journal Information:
J. Vac. Sci. Technol., B; (United States), Journal Name: J. Vac. Sci. Technol., B; (United States) Vol. 7:2; ISSN JVTBD
Country of Publication:
United States
Language:
English