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U.S. Department of Energy
Office of Scientific and Technical Information

Silicon ribbon growth by a capillary action shaping technique. Final report, May 8, 1975--November 8, 1977

Technical Report ·
OSTI ID:6400061
The crystal growth method under investigation is a capillary action shaping technique. Meniscus shaping for the desired ribbon geometry occurs at the vertex of a wettable die. As ribbon growth depletes the melt meniscus, capillary action supplies replacement material. The objective of the work is to attain a clear technological assessment of silicon ribbon growth by the capillary action shaping technique and to enhance the applicability of the technique to photovoltaic power device material. The results of crystal growth studies, structural and electrical characterization of cast silicon ribbons, and a silicon ribbon technology assessment are described. (WHK)
Research Organization:
International Business Machines Corp., Hopewell Junction, NY (USA). East Fishkill Lab.
DOE Contract Number:
NAS-7-100-954144
OSTI ID:
6400061
Report Number(s):
DOE/JPL/954144-1
Country of Publication:
United States
Language:
English