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U.S. Department of Energy
Office of Scientific and Technical Information

Silicon ribbon growth by a capillary action shaping technique. Annual report (Quarterly technical progress report No. 9)

Technical Report ·
DOI:https://doi.org/10.2172/5229221· OSTI ID:5229221
Progress on the technological and economical assessment of ribbon growth of silicon by a capillary action shaping technique is reported. Progress in scale-up of the process from 50 mm to 100 mm ribbon widths is presented, the use of vitreous carbon as a crucible material is analyzed, and preliminary tests of CVD Si/sub 3/N/sub 4/ as a potential die material are reported. Diffusion length measurements by SEM, equipment and procedure for defect display under MOS structure in silicon ribbon for lifetime interpretation, and an assessment of ribbon technology are discussed. (WHK)
Research Organization:
International Business Machines Corp., Hopewell Junction, NY (USA). East Fishkill Lab.
DOE Contract Number:
NAS-7-100-954144
OSTI ID:
5229221
Report Number(s):
ERDA/JPL/954144-77/3
Country of Publication:
United States
Language:
English