Final report on research on optical coatings

Technical Report · Tue Jan 13 04:00:00 EST 1981

DOI:https://doi.org/10.2172/6366048· OSTI ID:6366048

Haller, W; Sanders, D M; Farabaugh, E N

The construction of an apparatus designed to prepare thin films by physical vapor codeposition is described. This apparatus permits the characterization of the substrate prior to deposition using electron spectroscopy for chemical analysis, auger electron spectroscopy, secondary ion mass spectroscopy, and ion scattering spectroscopy. The system permits deposition of thin films by resistively heated boats and electron beam evaporation sources which can be operated simultaneously. The resulting films can be characterized using the above surface analysis techniques without exposure to the atmosphere using a transfer mechanism described in the report.

• Research Organization: National Bureau of Standards, Washington, DC (USA)
• Sponsoring Organization: USDOE
• DOE Contract Number: AI08-79DP40094
• OSTI ID: 6366048
• Report Number(s): DOE/DP/40094-T1
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360301* -- Composite Materials-- Preparation & Fabrication-- (-1987)
70 PLASMA PHYSICS AND FUSION TECHNOLOGY
700208 -- Fusion Power Plant Technology-- Inertial Confinement Technology
AUGER ELECTRON SPECTROSCOPY
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
COATINGS
CONFINEMENT
DEPOSITION
ELECTROMAGNETIC RADIATION
ELECTRON SPECTROSCOPY
INERTIAL CONFINEMENT
LASER RADIATION
MASS SPECTROSCOPY
OPTICAL SYSTEMS
PLASMA CONFINEMENT
RADIATIONS
SPECTROSCOPY
SUBSTRATES
SURFACE COATING