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Title: Low Z[sub 1]/low Z[sub 2] multilayer x-ray optical thin films

Conference ·
OSTI ID:6340530

The authors have deposited, via magnetron sputter deposition, multilayer structures comprised of alternating layers of low atomic number materials such as: (1) carbon and boron carbide, (2) silicon and boron carbide, (3) silicon and carbon and (4) aluminum and boron carbide. Layer periods for these materials combinations range from 63.5 to 75[angstrom]. These low atomic number multilayers exhibit significant first order Bragg diffraction of Cu k-alpha radiation. Calculations of the reflectivity performance for multilayers of this composition have been made using a computer code based on the Modified Darwin-Prinz theory. Experimental measurements and code predictions are in close agreement. Multilayers of this type may find application in devices requiring ultra-low dispersion focusing x-ray optics, such as long focal length focussed beam lines, x-ray microscopes and x-ray telescopes. Diagnostics for plasma characterization in fusion experiments that are free from Ledge absorption, high transmittance/high resolution beam splitting x-ray optics, and output couplers soft x-ray laser cavities are other possible applications for low-Z[sub 1]/low-Z[sub 2] multilayers.

Research Organization:
Lawrence Livermore National Lab., CA (United States)
Sponsoring Organization:
USDOE; USDOE, Washington, DC (United States)
DOE Contract Number:
W-7405-ENG-48
OSTI ID:
6340530
Report Number(s):
UCRL-JC-107573; CONF-9107115-82; ON: DE93017151
Resource Relation:
Conference: Society of Photo-Optical Instrumentation Engineers (SPIE) meeting, San Diego, CA (United States), 21-26 Jul 1991
Country of Publication:
United States
Language:
English