Low Z{sub 1}/low Z{sub 2} multilayer x-ray optical thin films

Technical Report · Sat Jun 01 00:00:00 EDT 1991

OSTI ID:10173145

Biltoft, P J; Pombo, R F

The authors have deposited, via magnetron sputter deposition, multilayer structures comprised of alternating layers of low atomic number materials such as: (1) carbon and boron carbide, (2) silicon and boron carbide, (3) silicon and carbon and (4) aluminum and boron carbide. Layer periods for these materials combinations range from 63.5 to 75{angstrom}. These low atomic number multilayers exhibit significant first order Bragg diffraction of Cu k-alpha radiation. Calculations of the reflectivity performance for multilayers of this composition have been made using a computer code based on the Modified Darwin-Prinz theory. Experimental measurements and code predictions are in close agreement. Multilayers of this type may find application in devices requiring ultra-low dispersion focusing x-ray optics, such as long focal length focussed beam lines, x-ray microscopes and x-ray telescopes. Diagnostics for plasma characterization in fusion experiments that are free from Ledge absorption, high transmittance/high resolution beam splitting x-ray optics, and output couplers soft x-ray laser cavities are other possible applications for low-Z{sub 1}/low-Z{sub 2} multilayers.

• Research Organization: Lawrence Livermore National Lab., CA (United States)
• Sponsoring Organization: USDOE, Washington, DC (United States)
• DOE Contract Number: W-7405-ENG-48
• OSTI ID: 10173145
• Report Number(s): UCRL-JC--107573; CONF-9107115--82; ON: DE93017151
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360606
440600
47 OTHER INSTRUMENTATION
BORON CARBIDES
BRAGG REFLECTION
CARBON
COMPARATIVE EVALUATIONS
COMPUTERIZED SIMULATION
DEPOSITION
EXPERIMENTAL DATA
NUMERICAL SOLUTION
OPTICAL INSTRUMENTATION
OPTICAL PROPERTIES
PHYSICAL PROPERTIES
REFLECTIVE COATINGS
REFLECTIVITY
SILICON
THIN FILMS
VAPOR DEPOSITED COATINGS