Multilayer films with sharp, stable interfaces for use in EUV and soft X-ray application

Patent · Mon Dec 31 23:00:00 EST 2001

OSTI ID:874470

Bajt, Sasa ^[1]

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1. Livermore, CA

The reflectivity and thermal stability of Mo/Si (molybdenum/silicon) multilayer films, used in soft x-ray and extreme ultraviolet region, is enhanced by deposition of a thin layer of boron carbide (e.g., B.sub.4 C) between alternating layers of Mo and Si. The invention is useful for reflective coatings for soft X-ray and extreme ultraviolet optics, multilayer for masks, coatings for other wavelengths and multilayers for masks that are more thermally stable than pure Mo/Si multilayers

• Research Organization: Lawrence Livermore National Laboratory (LLNL), Livermore, CA
• DOE Contract Number: W-7405-ENG-48
• Assignee: The Regents of the University of California (Oakland, CA)
• Patent Number(s): US 6396900
• OSTI ID: 874470
• Country of Publication: United States
• Language: English

Related Subjects

/378/
alternating
application
boron
boron carbide
bsub4
carbide
coatings
deposition
enhanced
euv
extreme
extreme ultraviolet
films
interfaces
layer
layer films
layers
masks
molybdenumsilicon
mosi
multilayer
multilayer film
multilayers
optics
pure
reflective
reflectivity
region
sharp
soft
stability
stable
thermal
thermal stability
thermally
ultraviolet
ultraviolet region
useful
wavelengths
x-ray