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Greatly improved 3C-SiC p-n junction diodes grown by chemical vapor deposition

Journal Article · · IEEE Electron Device Letters (Institute of Electrical and Electronics Engineers); (United States)
DOI:https://doi.org/10.1109/55.215136· OSTI ID:6338946
; ; ;  [1];  [2];  [3]
  1. NASA Lewis Research Center, Cleveland, OH (United States)
  2. Ohio Aerospace Inst., Brook Park (United States)
  3. Calspan Corp., Middleburg Heights, OH (United States)

In this paper the authors report on the fabrication and initial electrical characterization of greatly improved 3C-SiC ([beta]-SiC) p-n junction diodes. These diodes, which were grown on commercially available 6H-SiC substrates by chemical vapor deposition, demonstrate rectification to [minus]200 V at room temperature, representing a fourfold improvement in reported 3C-SiC diode blocking voltage. The reverse leakage currents and saturation current densities measured on these diodes also show significant improvement compared to previously reported 3C-SiC p-n junction diodes. When placed under sufficient forward bias, the diodes emit significantly bright green-yellow light. These results should lead to substantial advancements in 3C-SiC transistor performance.

OSTI ID:
6338946
Journal Information:
IEEE Electron Device Letters (Institute of Electrical and Electronics Engineers); (United States), Journal Name: IEEE Electron Device Letters (Institute of Electrical and Electronics Engineers); (United States) Vol. 14:3; ISSN 0741-3106; ISSN EDLEDZ
Country of Publication:
United States
Language:
English