Greatly improved 3C-SiC p-n junction diodes grown by chemical vapor deposition
- NASA Lewis Research Center, Cleveland, OH (United States)
- Ohio Aerospace Inst., Brook Park (United States)
- Calspan Corp., Middleburg Heights, OH (United States)
In this paper the authors report on the fabrication and initial electrical characterization of greatly improved 3C-SiC ([beta]-SiC) p-n junction diodes. These diodes, which were grown on commercially available 6H-SiC substrates by chemical vapor deposition, demonstrate rectification to [minus]200 V at room temperature, representing a fourfold improvement in reported 3C-SiC diode blocking voltage. The reverse leakage currents and saturation current densities measured on these diodes also show significant improvement compared to previously reported 3C-SiC p-n junction diodes. When placed under sufficient forward bias, the diodes emit significantly bright green-yellow light. These results should lead to substantial advancements in 3C-SiC transistor performance.
- OSTI ID:
- 6338946
- Journal Information:
- IEEE Electron Device Letters (Institute of Electrical and Electronics Engineers); (United States), Journal Name: IEEE Electron Device Letters (Institute of Electrical and Electronics Engineers); (United States) Vol. 14:3; ISSN 0741-3106; ISSN EDLEDZ
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
426000* -- Engineering-- Components
Electron Devices & Circuits-- (1990-)
CARBIDES
CARBON
CARBON COMPOUNDS
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
CURRENT DENSITY
CURRENTS
DEPOSITION
ELECTRIC CURRENTS
ELECTRICAL PROPERTIES
ELEMENTS
FABRICATION
JUNCTION DIODES
JUNCTIONS
LEAKAGE CURRENT
NONMETALS
P-N JUNCTIONS
PERFORMANCE
PHYSICAL PROPERTIES
SEMICONDUCTOR DEVICES
SEMICONDUCTOR DIODES
SEMICONDUCTOR JUNCTIONS
SILICON CARBIDES
SILICON COMPOUNDS
SURFACE COATING