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Organometallic chemical vapor deposition routes to high T/sub c/ superconducting Tl-Ba-Ca-Cu-O films

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.101515· OSTI ID:6337325

Films of the Tl-Ba-Ca-Cu-O high T/sub c/ superconductor can be prepared by either of two organometallic chemical vapor deposition routes. Ba-Ca-Cu-O films are first prepared on yttria-stabilized zirconia using the volatile precursors Ba(heptafluorodimethyloctanedionate)/sub 2,/ Ca(dipivaloylmethanate)2, and Cu(acetylacetonate)/sub 2./ Deposition is carried out at 5 Torr pressure with argon as the carrier gas and water vapor as the reactant gas. Thallium is next incorporated in these films either by vapor diffusion using bulk Tl-Ba-Ca-Cu-O as the source, or by organometallic chemical vapor deposition using Tl(cyclopentadienide) as the source. The latter deposition is carried out at atmospheric pressure with an argon carrier and water-saturated oxygen reactant, followed by rapid thermal annealing. Both types of films consist primarily of the TlBa/sub 2/Ca/sub 2/Cu/sub 3/O/sub x/ phase, have preferential orientation of the CuO planes parallel to the substrate surface, and exhibit onset of superconductivity at /similar to/120 K with zero resistance by 100 K.

Research Organization:
Northwestern University, Evanston, Illinois 60208
OSTI ID:
6337325
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 54:21; ISSN APPLA
Country of Publication:
United States
Language:
English

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