Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Organometallic chemical vapor deposition of high T/sub c/ superconducting Bi-Sr-Ca-Cu-O films

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.101481· OSTI ID:6229761
Films of the high T/sub c/ Bi-Sr-Ca-Cu-O superconductor have been prepared by organometallic chemical vapor deposition using the volatile metalorganic precursors Cu(acetylacetonate)/sub 2/ , Sr(dipivaloylmethanate)/sub 2/ , and Ca(dipivaloylmethanate)/sub 2/, and triphenylbismuth. Deposition is carried out at 2 Torr with argon as the carrier gas and oxygen and water vapor as reactants. Film growth rates of 2--3 ..mu..m/h are achieved. After annealing under oxygen, energy dispersive x-ray analysis and x-ray diffraction data reveal that such films on (100) single-crystal MgO consist predominantly of the Bi/sub 2/(Sr,Ca)/sub 3/Cu/sub 2/O/sub x/, T/sub c/ = 85 K, phase and have preferential orientation of the crystallite c axes perpendicular to the substrate surface. Four-probe resistivity measurements reveal the onset of film superconductivity at approx.110 K and zero resistance by 75 K.
Research Organization:
Northwestern University, Evanston, Illinois 60208
OSTI ID:
6229761
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 54:12; ISSN APPLA
Country of Publication:
United States
Language:
English

Similar Records

Formation of oriented high T sub c superconducting Bi-Sr-Ca-Cu-O thin films on silver substrates by organometallic chemical vapor deposition
Journal Article · Sun Mar 04 23:00:00 EST 1990 · Applied Physics Letters; (USA) · OSTI ID:7007592

Preparation of high- T sub c superconducting Bi-Sr-Ca-Cu-O films by organometallic chemical vapor deposition using second-generation fluorocarbon-based precursors
Journal Article · Thu Feb 14 23:00:00 EST 1991 · Journal of Applied Physics; (USA) · OSTI ID:5772158

Organometallic chemical vapor deposition of high T/sub c/ superconducting films using a volatile, fluorocarbon-based precursor
Journal Article · Sun Oct 30 23:00:00 EST 1988 · Appl. Phys. Lett.; (United States) · OSTI ID:6872432