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Title: Photoemission study of the CoSi/sub 2/(111)--Si surface

Journal Article · · J. Vac. Sci. Technol., A; (United States)
DOI:https://doi.org/10.1116/1.575919· OSTI ID:6336280

Epitaxial CoSi/sub 2/ terminated with a thin Si bilayer has been studied by synchrotron radiation photoemission. This well-defined surface phase of CoSi/sub 2/ is obtained by high-temperature annealing in the range 450--650 /sup 0/C. The samples used were prepared by molecular-beam epitaxy techniques with a film thickness of /similar to/800 A on Si(111) substrates and capped with a /similar to/100 A film of a-Si to act as an oxide barrier while samples were transferred to the photoemission chamber. The surfaces studied by photoemission were prepared by careful sputtering to remove the oxide and a-Si layer and then anealed to /similar to/450--650 /sup 0/C for 1 min. Photoemission spectra were taken with total resolution in the range 200--237 meV and show evidence for four spin--orbit doublets. Our samples and results are somewhat different from those of previous studies of thin CoSi/sub 2/ films or studies of bulk CoSi/sub 2/ samples. We find three surface Si(2p) components: one shifted to higher binding energy and two shifted below the main Si(2p) spin-orbit doublet in CoSi/sub 2/. We find the Si(2p/sub 3/2/ ) energy in CoSi/sub 2/ is 99.40 eV measured with respect to the Fermi level; the three surface-shifted Si components are at -0.75, 0.17, and -0.18 eV relative to the main component in order of decreasing intensity and thus layer distance from the surface. A structural model previously proposed for thin CoSi/sub 2/ layers is shown to be qualitatively consistent with these results.

Research Organization:
ATandT Bell Laboratories, Murray Hill, New Jersey 07974
OSTI ID:
6336280
Journal Information:
J. Vac. Sci. Technol., A; (United States), Vol. 7:3
Country of Publication:
United States
Language:
English