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Doping of InP with bismuth

Journal Article · · Inorg. Mater. (Engl. Transl.); (United States)
OSTI ID:6336169

The influence of bismuth IVI on the electrophysical and structural characteristics of indium phosphide crystals was investigated. Single crystals were grown by the Czochralski method. In calculating the partition factor for the bismuth in the InP, its concentration in the solid phase was determined by atomic absorption analysis. The electrophysical characteristics of the Bi-doped InP crystals were found from the Hall effect by the standard method. The dislocation density in the bismuth-doped indium phosphide did not decrease perceptibly from that in undoped control specimens. The results obtained in studying the electrophysical characteristics of the Bi-doped InP crystals showed all the specimens to have p-type conductivity; doping with this isoelectronic impurity did not lead to appearance of donor or acceptor centers.

Research Organization:
M.I. Kalinin Leningrad Polytechnic Institute (USSR)
OSTI ID:
6336169
Journal Information:
Inorg. Mater. (Engl. Transl.); (United States), Journal Name: Inorg. Mater. (Engl. Transl.); (United States) Vol. 24:3; ISSN INOMA
Country of Publication:
United States
Language:
English